EUV lithography is now used to manufacture the most advanced integrated circuits, including memory, logic and AI chips, but Moore’s Law demands constant improvements. The NXE system is our 0.33NA platform which continues to evolve with better throughput via greater EUV source power, smaller Edge Placement Errors (EPE) and higher uptime. One possibility for further EPE reduction is to increase image contrast through the use of advanced exposure methods such as Dual Monopole.
Speaker
Tim Brunner
Tim Brunner holds a B.A. from Carleton College and a Ph.D from MIT, all in physics. He has worked in the area of lithography for chip production since 1981. After many years at IBM, he joined ASML in 2019, working in the Technology Development Center.
Explore
MIT Researchers use AI to Uncover Atomic Defects in Materials
Zach Winn | MIT News
A new model measures defects that can be leveraged to improve materials’ mechanical strength, heat transfer, and energy-conversion efficiency.
“Near-misses” in Particle Accelerators can Illuminate New Physics, Study finds
Jennifer Chu | MIT News
Physicists discovered new properties of the strong force by analyzing what happens when light-speed particles skim by each other.
Why Solid-state Batteries Keep Short-circuiting
Zach Winn | MIT News
New insights into metallic cracks that harm battery performance could advance the longstanding quest to develop energy-dense solid-state batteries.